Patent · US Active

Imprint apparatus, imprint method, and article manufacturing method

US11759994B2 · kind B2 · utility

0Cited by
0References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJul 20, 2020
Grant dateSep 19, 2023
Priority date
Expiry dateJan 31, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29C2037/90
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, includes a mold holding unit including an actuator for moving mold, a force sensor detecting force generated by actuator, a position sensor measuring a position of mold, and a controlling unit controlling operation of mold holding unit. The controlling unit controls mold holding unit according to either a force imprint profile or a position imprint profile. The force imprint profile is for controlling movement of mold based on force generated by actuator and detected by force sensor. The position imprint profile is for controlling movement of mold based on position of mold measured by position sensor. When pattern of imprint material is formed on substrate, either force imprint profile or position imprint profile is selectable.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.