Detachable atomic layer deposition apparatus for powders
US11767591B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 30, 2021 |
| Grant date | Sep 26, 2023 |
| Priority date | — |
| Expiry date | Jun 10, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4557
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A detachable atomic layer deposition apparatus for powders is disclosed, which includes a vacuum chamber, a shaft sealing device, and a driving unit. The driving unit is connected to the shaft sealing device. The vacuum chamber is fixed to one end of the shaft sealing device via at least one fixing member. The driving unit drives the vacuum chamber to rotate via the shaft sealing device to agitate the powders in a reaction space of the vacuum chamber to facilitate the formation of thin films with uniform thickness on the surface of the powders. In addition, the vacuum chamber can be removed from the shaft sealing device for users to take out the powders from the vacuum chamber and clean the vacuum chamber, thereby improving the convenience in usage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.