Gas-dispersing apparatus for multiple chemical resources
US11767592B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2020 |
| Grant date | Sep 26, 2023 |
| Priority date | — |
| Expiry date | Dec 3, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32449
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention discloses a gas dispensing apparatus for multiple chemical resources, including: a showerhead assembly having at least two layers of board bodies and a gas mixing chamber defined at a center of the at least two layers of board bodies, and the gas mixing chamber having multiple holes defined thereon; and a pipeline assembly mounted to the showerhead assembly and having a stepped body defining at least two pipelines, the stepped body being configured to connect to the at least two layers of the board bodies to define at least two gas cavities, each of the gas cavities communicating with the corresponding one of the pipelines, each of the gas cavities communicating with the holes defined on the gas mixing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.