Patent · US Active

Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process

US11774859B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Alexander Freytag · Erfurt, DE
Christoph Husemann · Jena, DE
Dirk Seidel · Jena, DE
Carsten Schmidt · Jena, DE

Key dates

Filing date	Nov 3, 2020
Grant date	Oct 3, 2023
Priority date	—
Expiry date	May 20, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30148
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

The present invention relates to a method and an apparatus for determining at least one unknown effect of defects of an element of a photolithography process. The method comprises the steps of: (a) providing a model of machine learning for a relationship between an image, design data associated with the image and at least one effect of the defects of the element of the photolithography process arising from the image; (b) training the model of machine learning using a multiplicity of images used for training purposes, design data associated with the images used for training purposes and corresponding effects of the defects; and (c) determining the at least one unknown effect of the defects by applying the trained model to a measured image and the design data associated with the measured image.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.