Patent · US Active

Method for removing a particle from a mask system

US11774870B2 · kind B2 · utility

0Cited by

2References

24Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
Carl Zeiss SMS Ltd. · IL

Inventors

Sergey Oshemkov · Le Blanc-Mesnil, FR
Shao-Chi Wei · Hsinchu, TW
Joerg Frederik Blumrich · Jena, DE
Martin Voelcker · Oberkochen, DE
Thomas Scheruebl · Jena, DE

Key dates

Filing date	Aug 8, 2022
Grant date	Oct 3, 2023
Priority date	—
Expiry date	Aug 8, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for removing particles from a mask system for a projection exposure apparatus, including the following method steps: detecting the particle in the mask system, providing laser radiation, and removing the particle by irradiating the particle with laser radiation. The wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.