Patent · US Active

System for asymmetric optical beam shaping

US11780033B2 · kind B2 · utility

0Cited by

18References

13Claims

0Family size

Assignee

TRUMPF LASER- UND SYSTEMTECHNIK GMBH · DE

Inventors

Malte Kumkar · Weimar, DE
Jonas Kleiner · Ditzingen, DE
Daniel Grossmann · Schramberg, DE
Daniel Flamm · Walnut Creek, US
Myriam Kaiser · Ditzingen, DE

Key dates

Filing date	Dec 18, 2020
Grant date	Oct 10, 2023
Priority date	—
Expiry date	Jan 5, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG02B27/095
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

For material processing of a material, which is in particular for a laser beam to a large extent transparent, asymmetric shaped modifications are created transverse to the propagation direction of the laser beam. Thereby, the laser beam is shaped for forming an elongated focus zone in the material, wherein the focus zone is such that it includes at least one intensity maximum, which is transverse flattened in a flattening direction, or a transverse and/or axial sequence of asymmetric intensity maxima, which are flattened in a sequence direction. After positioning the focus zone in the material, a modification is created and the material and the focus zone are moved relative to each other in the or across to the flattening direction or in the or across to the sequence direction for forming a crack along an induced preferred direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.