Patent · US Active

Optical element for a deep ultraviolet light source

US11784452B2 · kind B2 · utility

0Cited by

3References

29Claims

0Family size

Assignee

Cymer, LLC · US

Inventors

Saptaparna Das · San Diego, US
Eric Anders Mason · San Diego, US
John T. Melchior · San Diego, US

Key dates

Filing date	Feb 5, 2020
Grant date	Oct 10, 2023
Priority date	—
Expiry date	Apr 7, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01S3/2308
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical element for a deep-ultraviolet light source includes a crystalline substrate; a coating on an exterior surface of the crystalline substrate, the coating having a thickness along a direction that extends away from the exterior surface; and a structure on and/or in the coating, the structure including a plurality of features that extend away from the crystalline substrate along the direction. The features include an amorphous dielectric material and are arranged such that an index of refraction of the structure varies along the direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.