Patent · US Active

Facet mirror for an illumination optical unit of a projection exposure apparatus

US11789367B2 · kind B2 · utility

0Cited by

2References

21Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Willi Anderl · Wertingen, DE
Christian Körner · Bergen, DE
Hubert Holderer · Oberkochen, DE
Markus Holz · Aalen, DE
Manuel Stompe · Planegg, DE
Stefan Seitz · Windach, DE

Key dates

Filing date	Mar 15, 2022
Grant date	Oct 17, 2023
Priority date	—
Expiry date	Mar 15, 2042

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70983
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A facet mirror for an illumination optical unit of a projection exposure apparatus has a large number of displaceable individual facets with a facet main body and a reflection surface arranged on it. At least some of the individual facets have a displacement range such that they come into contact with a stop surface in one or more displacement positions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.