Method of aerosol deposition coating for plasma resistant coating
US11795547B2 · kind B2 · utility
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2References
5Claims
0Family size
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Key dates
| Filing date | Jul 17, 2018 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | Jan 3, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed is an aerosol-deposition-coating method for plasma-resistant coating, in which the inside of a processing device can be protected from plasma during a plasma-etching process, the roughness of a coating layer on a metal substrate can be decreased to thereby reduce the generation of particles, and adhesion between the coating layer and the metal substrate can be enhanced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.