Patent · US Active

Mechanical alignment of x-ray sources

US11800625B2 · kind B2 · utility

0Cited by
1References
14Claims
0Family size

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Key dates

Filing dateNov 4, 2019
Grant dateOct 24, 2023
Priority date
Expiry dateAug 5, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05G2/007
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.