Shock wave visualization for extreme ultraviolet plasma optimization
US11800626B2 · kind B2 · utility
1Cited by
12References
20Claims
0Family size
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Key dates
| Filing date | Jul 26, 2022 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | Jul 26, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0035
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method for monitoring a shock wave in an extreme ultraviolet light source includes irradiating a target droplet in the extreme ultraviolet light source apparatus of an extreme ultraviolet lithography tool with ionizing radiation to generate a plasma and to detect a shock wave generated by the plasma. One or more operating parameters of the extreme ultraviolet light source is adjusted based on the detected shock wave.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.