Composition, method for cleaning adhesive polymer, method for producing device wafer, and method for regenerating support wafer
US11807837B2 · kind B2 · utility
1Cited by
2References
19Claims
0Family size
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Key dates
| Filing date | Sep 26, 2019 |
| Grant date | Nov 7, 2023 |
| Priority date | — |
| Expiry date | Aug 16, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02057
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided is a composition having high affinity for the surface of an adhesive, and excellent long-term storage stability. This composition comprises: a quaternary alkylammonium fluoride or a hydrate of a quaternary alkylammonium fluoride; and an aprotic solvent, wherein the aprotic solvent includes (A) an N-substituted amide compound having 4 or more carbon atoms and not containing active hydrogen on a nitrogen atom, and (B) an ether compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.