Composite overlay metrology target
US11809090B2 · kind B2 · utility
0Cited by
7References
49Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 18, 2020 |
| Grant date | Nov 7, 2023 |
| Priority date | — |
| Expiry date | May 22, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/6113
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology target includes a first set of pattern elements compatible with a first metrology mode along one or more directions, and a second set of pattern elements compatible with a second metrology mode along one or more directions, wherein the second set of pattern elements includes a first portion of the first set of pattern elements, and wherein the second set of pattern elements is surrounded by a second portion of the first set of pattern elements not included in the second set of pattern elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.