Nanofluidic device with silicon nitride membrane

US11819847B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Ryan Smith · San Clemente, US
• Roger QUON · Rhinebeck, US
• David Collins · Delmar, US
• George Odlum · Red Hook, US
• Raghav Sreenivasan · Fremont, US
• Joseph R. Johnson · Palo Alto, US

Key dates

• Filing date: Jul 20, 2020
• Grant date: Nov 21, 2023
• Expiry date: Oct 24, 2041

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01L2300/12
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Embodiments of the present disclosure provide nanopore devices, such as nanopore sensors and/or other nanofluidic devices. In one or more embodiments, a nanopore device contains a substrate, an optional lower protective oxide layer disposed on the substrate, a membrane disposed on the lower protective oxide layer, and an optional upper protective oxide layer disposed on the membrane. The membrane has a pore and contains silicon nitride. The silicon nitride has a nitrogen to silicon ratio of about 0.98 to about 1.02 and the membrane has an intrinsic stress value of about −1,000 MPa to about 1,000 MPa. The nanopore device also contains a channel extending through at least the substrate, the lower protective oxide layer, the membrane, the upper protective oxide layer, and the upper protective silicon nitride layer.