Method of manufacturing ruthenium-containing thin film and ruthenium-containing thin film manufactured therefrom
US11827650B2 · kind B2 · utility
0Cited by
2References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2018 |
| Grant date | Nov 28, 2023 |
| Priority date | — |
| Expiry date | Mar 23, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76843
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided are a method of manufacturing a ruthenium-containing thin film and a ruthenium-containing thin film manufactured therefrom, and the method of manufacturing a ruthenium-containing thin film of the present invention uses a ruthenium(0)-based hydrocarbon compound and specific reaction gas, whereby a high-purity thin film may be easily manufactured by a simple process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.