Patent · US Active

Photoresist compositions and methods

US11829069B2 · kind B2 · utility

1Cited by

22References

13Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Joshua Kaitz · Watertown, US
Tomas Marangoni · Marlborough, US
Emad Aqad · Northborough, US
Amy M. Kwok · Shrewsbury, US
Mingqi Li · Sammamish, US
Thomas Cardolaccia · Natick, US
Choong-Bong Lee · Westborough, US
Ke Yang · Zhuolan Township, TW
Cong Liu · Lanzhou, CN

Key dates

Filing date	Dec 31, 2018
Grant date	Nov 28, 2023
Priority date	—
Expiry date	Dec 31, 2038

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08L33/06
WIPO fieldOptics
WIPO sectorInstruments

Abstract

New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.