Mingqi Li
80Patents
5h-index
74Co-inventors
75Inventor score
Filing activity: Jun 27, 2002 → Dec 29, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9442377B1 | Wet-strippable silicon-containing antireflectant | Physics | 14 | Active |
| US10031420B2 | Wet-strippable silicon-containing antireflectant | Physics | 13 | Active |
| US6842937B2 | Rain-gutter cleaning tool set | Fixed Constructions | 12 | Expired |
| US9156785B2 | Base reactive photoacid generators and photoresists comprising same | Physics | 6 | Active |
| US9029065B2 | Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article | Chemistry; Metallurgy | 5 | Active |
| US9046767B2 | Photoacid generator, photoresist, coated substrate, and method of forming an electronic device | Chemistry; Metallurgy | 5 | Active |
| US8900794B2 | Photoacid generator and photoresist comprising same | Chemistry; Metallurgy | 5 | Active |
| US9348220B2 | Photoacid generators and photoresists comprising same | Physics | 5 | Active |
| US9209067B2 | Gap-fill methods | Electricity | 4 | Active |
| US8758090B2 | Polishing method and polishing device | Performing Operations; Transporting | 4 | Active |
| US8851959B2 | Chemical mechanical polishing device and polishing element | Performing Operations; Transporting | 4 | Active |
| US8603728B2 | Polymer composition and photoresist comprising the polymer | Physics | 3 | Active |
| US8815728B2 | Semiconductor device having metal alloy gate and method for manufacturing the same | Electricity | 3 | Active |
| US9671697B2 | Pattern treatment methods | Electricity | 3 | Active |
| US9508549B2 | Methods of forming electronic devices including filling porous features with a polymer | Electricity | 3 | Active |
| US10114288B2 | Silicon-containing underlayers | Chemistry; Metallurgy | 3 | Active |
| US9665005B2 | Pattern treatment methods | Electricity | 2 | Active |
| US8338077B2 | Photoacid generators and photoresists comprising same | Physics | 2 | Active |
| US9684241B2 | Compositions and methods for pattern treatment | Electricity | 2 | Active |
| US8956799B2 | Photoacid generator and photoresist comprising same | Physics | 2 | Active |
| US10241411B2 | Topcoat compositions containing fluorinated thermal acid generators | Electricity | 2 | Active |
| US9511475B2 | Polishing device for removing polishing byproducts | Chemistry; Metallurgy | 2 | Active |
| US9507259B2 | Photoresist composition | Physics | 2 | Active |
| US8313991B2 | Method for fabricating a high-K metal gate MOS | Electricity | 2 | Active |
| US9663682B2 | Methods for manufacturing block copolymers and articles manufactured therefrom | Chemistry; Metallurgy | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.