Focusing device and EUV radiation generating device having same
US11835699B2 · kind B2 · utility
0Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2020 |
| Grant date | Dec 5, 2023 |
| Priority date | — |
| Expiry date | Dec 16, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0086
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A focusing device for focusing a laser beam in a target area. The focusing device includes a paraboloid mirror configured to widen the laser beam; an ellipsoid mirror or a hyperboloid mirror configured to focus the widened laser beam at a focal position within the target area; and a movement device. The movement device is configured to move the ellipsoid mirror or the hyperboloid mirror relative to the paraboloid mirror, or together with the paraboloid mirror, to change the focal position within the target area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.