Cleaning liquid composition and cleaning method using same
US11845912B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Aug 7, 2019 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | Apr 18, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.