Chain scission photoresists and methods for forming chain scission photoresists
US11846883B2 · kind B2 · utility
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1References
10Claims
0Family size
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Key dates
| Filing date | Sep 28, 2018 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | Jun 14, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist is disclosed. The photoresist includes a polymer with one repeating unit and an absorbing unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.