Lauren Doyle
5Patents
0h-index
14Co-inventors
31Inventor score
Filing activity: Sep 28, 2018 → May 6, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11984317B2 | EUV patterning methods, structures, and materials | Physics | 0 | Active |
| US12012473B2 | Directed self-assembly structures and techniques | Electricity | 0 | Active |
| US11262654B2 | Chain scission resist compositions for EUV lithography applications | Physics | 0 | Active |
| US12037434B2 | Chemical compositions and methods of patterning microelectronic device structures | Electricity | 0 | Active |
| US11846883B2 | Chain scission photoresists and methods for forming chain scission photoresists | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.