Faceplate having a curved surface

US11851759B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Shailendra Srivastava · Fremont, US
• Sai Susmita Addepalli · San Jose, US
• Nikhil Sudhindrarao Jorapur · Sunnyvale, US
• Daemian Raj Benjamin Raj · Fremont, US
• Amit Kumar BANSAL · Milpitas, US
• Juan Carlos Rocha-Alvarez · Redwood City, US
• Gregory Eugene CHICHKANOFF · Mountain View, US
• Xinhai Han · Santa Clara, US
• Masaki Ogata · San Jose, US
• Kristopher Enslow · Carlsbad, US
• Wenjiao Wang · San Jose, US

Key dates

• Filing date: Dec 16, 2022
• Grant date: Dec 26, 2023
• Expiry date: Dec 16, 2042

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/3321
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A faceplate for a substrate process chamber comprises a first and second surface. The second surface is shaped such that the second surface includes a peak and a distance between the first and second surface varies across the width of the faceplate. The second surface of the faceplate is exposed to a processing volume of the process chamber. Further, the faceplate may be part of a lid assembly for the process chamber. The lid assembly may include a blocker plate facing the first surface of the faceplate. A distance between the blocker plate and the first surface is constant.