Plasma detecting device
US11854774B2 · kind B2 · utility
0Cited by
1References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2021 |
| Grant date | Dec 26, 2023 |
| Priority date | — |
| Expiry date | May 13, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed is a detection device which includes a measurement unit including an illumination sensor that measures an amount of light in an interior of a chamber, and a detection unit that detects whether plasma is generated in the interior of the chamber, through analysis of the amount of the light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.