Multiple-tool parameter set calibration and misregistration measurement system and method
US11862521B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 18, 2020 |
| Grant date | Jan 2, 2024 |
| Priority date | — |
| Expiry date | Nov 9, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A multiple-tool parameter set calibration and misregistration measurement method useful in the manufacture of semiconductor devices including using at least a first reference misregistration metrology tool using a first set of measurement parameters to measure misregistration between at least two layers on a wafer of a batch of wafers, thereby generating a first misregistration data set, transmitting the first set of parameters and the data set to a calibrated set of measurement parameters generator (CSMPG) which processes the first set of parameters and the data set thereby generating a calibrated set of measurement parameters which are transmitted from the CSMPG to calibrate at least one initially-uncalibrated misregistration metrology tool based on the calibrated set of measurement parameters. Thereafter, misregistration is measured between at least two layers of at least one wafer, using at least the initially-uncalibrated misregistration metrology tool using the calibrated set of measurement parameters for the measuring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.