Substrate support cover for high-temperature corrosive environment

US11866821B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Shuran Sheng · Sunnyvale, US
• Lin Zhang · Qiaonanxiang, CN
• Jiyong Huang · Rockwall, US
• Joseph C. Werner · Santa Clara, US
• Stanley Wu · San Ramon, US
• Mahesh Adinath Kanawade · Santa Clara, US
• Yikai Chen · San Jose, US
• Yixing Lin · Saratoga, US
• Ying Ma · Shanghai, CN

Key dates

• Filing date: Mar 2, 2020
• Grant date: Jan 9, 2024
• Expiry date: Mar 13, 2041

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01F17/229
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments of the present disclosure generally relate to an apparatus and a method for cleaning a processing chamber. In one embodiment, a substrate support cover includes a bulk member coated with a fluoride coating. The substrate support cover is placed on a substrate support disposed in the processing chamber during a cleaning process. The fluoride coating does not react with the cleaning species. The substrate support cover protects the substrate support from reacting with the cleaning species, leading to reduced condensation formed on chamber components, which in turn leads to reduced contamination of the substrate in subsequent processes.