Optical emission spectroscopy control of gas flow in processing chambers

US11868147B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Philip DiGiacomo · Palo Alto, US
• Sunil Kumar Garg · Sunnyvale, US
• Paul Kiely · Leixlip, IE
• Keith A. Miller · Schererville, US
• Rajat Agrawal · Bolingbrook, US

Key dates

• Filing date: Mar 11, 2021
• Grant date: Jan 9, 2024
• Expiry date: Mar 10, 2042

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2021/8416
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.