Substrate processing apparatus, substrate processing method and non-transitory computer-readable recording medium
US11869764B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2022 |
| Grant date | Jan 9, 2024 |
| Priority date | — |
| Expiry date | Sep 13, 2042 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Described herein is a technique capable of acquiring, monitoring and recording the progress of the reaction between a substrate and a reactive gas contained in a process gas in a process chamber during the processing of the substrate. According to the technique, there is provided a substrate processing apparatus including: a process chamber accommodating a substrate; a process gas supply system configured to supply a process gas into the process chamber via a process gas supply pipe; an exhaust pipe configured to exhaust an inner atmosphere of the process chamber; a first gas concentration sensor configured to detect a first concentration of a reactive gas contained in the process gas in the process gas supply pipe; and a second gas concentration sensor configured to detect a second concentration of the reactive gas contained in an exhaust gas in the exhaust pipe.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.