Substrate processing apparatus and substrate processing method
US11879839B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Jul 28, 2021 |
| Grant date | Jan 23, 2024 |
| Priority date | — |
| Expiry date | Jan 20, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/392
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A substrate processing apparatus includes a supply channel through which a liquid to be supplied to a substrate flows; and a foreign substance detecting unit configured to detect a foreign substance in the liquid based on a signal obtained when light, which is near-infrared light, is radiated toward a flow path forming unit constituting a part of the supply channel by a light projector so that light is emitted from the flow path forming unit and a light receiver receives the light emitted from the flow path forming unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.