Method and system for nanoscale data recording
US11886123B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Mar 7, 2022 |
| Grant date | Jan 30, 2024 |
| Priority date | — |
| Expiry date | Mar 24, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structure, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.