Franklin Mark Schellenberg
33Patents
10h-index
26Co-inventors
75Inventor score
Filing activity: Aug 31, 1987 → Mar 7, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6643616B1 | Integrated device structure prediction based on model curvature | Physics | 60 | Expired |
| US4791631A | Wide tolerance, modulated blue laser source | Electricity | 58 | Expired |
| US6778695B1 | Design-based reticle defect prioritization | Physics | 53 | Expired |
| US5105298A | Birefringent structures formed by photo-exposure of polymer films and method for fabrication thereof | Emerging Cross-Sectional Technologies | 40 | Expired |
| US5161039A | Birefringent structures formed by photo-exposure of polymer films and method for fabrication thereof | Physics | 31 | Expired |
| US7172838B2 | Chromeless phase mask layout generation | Emerging Cross-Sectional Technologies | 29 | Expired |
| US5362584A | Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas | Physics | 25 | Expired |
| US6728946B1 | Method and apparatus for creating photolithographic masks | Physics | 22 | Expired |
| US7392168B2 | Method of compensating for etch effects in photolithographic processing | Physics | 11 | Expired |
| US5547705A | Nonlinear optical device and method of manufacturing same | Performing Operations; Transporting | 11 | Expired |
| US6159641A | Method for the repair of defects in lithographic masks | Physics | 10 | Expired |
| US5031993A | Detecting polarization state of an optical wavefront | Physics | 9 | Expired |
| US7174531B2 | Creating photolithographic masks | Physics | 8 | Expired |
| US9160847B2 | Visual translation for an IVR system | Electricity | 7 | Active |
| US8507881B2 | Nanolithography system | Physics | 3 | Active |
| US11012561B2 | Visual translation for an IVR system | Electricity | 2 | Active |
| US7586583B2 | Nanolithography system | Physics | 2 | Active |
| US11336768B2 | Visual translation for telephone commands | Electricity | 1 | Active |
| US9891536B2 | System for creating nanoscale patterns | Physics | 1 | Active |
| US9442382B2 | Super-resolution exposure system | Physics | 1 | Active |
| US10191385B2 | Nanoscale pattern exposure system | Physics | 0 | Active |
| US8841637B2 | Method for nanolithography | Physics | 0 | Active |
| US8710463B1 | Illuminating waveguide fabrication method | Physics | 0 | Active |
| US9229330B2 | Method for writing nanoscale patterns | Physics | 0 | Active |
| US11886123B2 | Method and system for nanoscale data recording | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.