Composite ion source based upon heterogeneous metal-metal fluoride system
US11887806B2 · kind B2 · utility
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Key dates
| Filing date | Apr 7, 2022 |
| Grant date | Jan 30, 2024 |
| Priority date | — |
| Expiry date | Aug 3, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0815
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source is provided. The ion source may include an ion chamber to generate an ion beam comprising a metal ion species; and a charge source, coupled to deliver a metal vapor to the ion chamber, the charge source including a charge mixture. The charge mixture may include a first portion, comprising an elemental metal; and a second portion, comprising a heterogeneous metal fluoride compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.