Patent · US Active

Methods for forming lateral heterojunctions in two-dimensional materials integrated with multiferroic layers

US11894449B2 · kind B2 · utility

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Key dates

Filing dateSep 28, 2022
Grant dateFeb 6, 2024
Priority date
Expiry dateOct 28, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/822
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Heterostructures include a layer of a two-dimensional material placed on a multiferroic layer. An ordered array of differing polarization domains in the multiferroic layer produces corresponding domains having differing properties in the two-dimensional material. When the multiferroic layer is ferroelectric, the ferroelectric polarization domains in the layer produce local electric fields that penetrate the two-dimensional material. The local electric fields modulate the charge carriers and carrier density on a nanometer length scale, resulting in the formation of lateral p-n or p-i-n junctions, and variations thereof appropriate for device functions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.