Fluid flow control system comprising a manifold assembly

US11899477B2 · kind B2 · utility

Assignee

• ICHOR SYSTEMS, INC.

Inventors

• Philip Ryan Barros · Pleasanton, US
• Greg Patrick Mulligan · Milpitas, US

Key dates

• Filing date: Feb 14, 2022
• Grant date: Feb 13, 2024
• Expiry date: May 5, 2042

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67017
• WIPO field: Control
• WIPO sector: Instruments

Abstract

Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.