Metrology system and method for measuring an excitation laser beam in an EUV plasma source

US11920977B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Matthias Manger · Neukochen, DE
• Florian Baumer · Oberkochen, DE

Key dates

• Filing date: Mar 4, 2021
• Grant date: Mar 5, 2024
• Expiry date: Aug 7, 2042

Classification

• Technology area (CPC G): Physics
• CPC primary: G01J2009/0234
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled from the excitation laser beam after a reflection on the target material. Each of the first beam analysis system and the second beam analysis system has at least one wavefront sensor system.