Mask cleaning
US11921434B2 · kind B2 · utility
0Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2022 |
| Grant date | Mar 5, 2024 |
| Priority date | — |
| Expiry date | Dec 15, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus includes a vacuum chamber, a reflective optical element arranged in the vacuum chamber and configured to reflect an extreme ultra-violet (EUV) light, and a cleaning module positioned in the vacuum chamber. the cleaning module is operable to provide a mitigation gas flowing towards the reflective optical element and provide a hydrogen-containing gas flowing towards the reflective optical element. The mitigation gas mitigates, by chemical reaction, contamination of the reflective optical element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.