Methods and assemblies for gas flow ratio control
US11923221B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2022 |
| Grant date | Mar 5, 2024 |
| Priority date | — |
| Expiry date | Sep 27, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A master controller determines a first flow setpoint for a process flow gas and/or a carrier gas flow through a first mass flow controller. The master controller obtains a back pressure setpoint of a distribution manifold and determines a second flow setpoint for the process gas flow and/or the carrier gas flow through a second mass flow controller or a back pressure controller based on the determined first flow setpoint and the obtained back pressure setpoint. The master controller controls the process gas flow and/or the carrier gas flow through the first mass flow controller to the first flow setpoint and the second mass flow controller and/or the back pressure controller to the second flow setpoint. The master controller controls the back pressure of the distribution manifold to the back pressure set point in view of a back pressure reading from a back pressure sensor of the distribution manifold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.