Hardmask composition and method of forming patterns
US11932715B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Dec 21, 2021 |
| Grant date | Mar 19, 2024 |
| Priority date | — |
| Expiry date | Mar 14, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A hardmask composition and a method of forming patterns using the hardmask composition, the composition including a polymer including a moiety derived from a compound represented by Chemical Formula 1; and a solvent:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.