Patent · US Active

Chip warpage reduction via raised free bending and re-entrant (auxetic) trace geometries

US11935810B2 · kind B2 · utility

0Cited by
0References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 6, 2021
Grant dateMar 19, 2024
Priority date
Expiry dateOct 9, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24942
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A microelectronic device and method of making the same including a substrate and at least one expansion layer that adds stress to the substrate when said substrate expands.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.