Patent · US Active

Module for chemically processing a substrate

US11938522B2 · kind B2 · utility

0Cited by

2References

19Claims

0Family size

Assignee

SEMSYSCO GMBH · AT

Inventors

Andreas Gleissner · Radenthein, AT
Herbert Ötzlinger · Hallwang, AT
Raoul Schröder · Neuenstein, DE
Oliver Knoll · Salzburg, AT

Key dates

Filing date	Dec 1, 2020
Grant date	Mar 26, 2024
Priority date	—
Expiry date	Dec 1, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67086
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

The invention relates to a module for chemically processing a substrate, a method for chemically processing a substrate and a use of a module for chemically processing a substrate and in particular a large substrate. The module for chemically processing a substrate comprises: an immersion chamber, a spray unit, and a motion unit (14). The immersion chamber is configured to receive a first liquid and the substrate, so that the substrate is immersed in the liquid. The spray unit comprises a plurality of spray nozzles, which are configured to spray a second liquid within the immersion chamber. The motion unit is configured to provide a relative motion between the substrate and the spray unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.