Method of fabricating reticle
US11940737B2 · kind B2 · utility
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10References
20Claims
0Family size
Assignee
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Key dates
| Filing date | May 7, 2021 |
| Grant date | Mar 26, 2024 |
| Priority date | — |
| Expiry date | Aug 22, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.