Patent · US Active

Dielectric film-forming composition

US11945894B2 · kind B2 · utility

0Cited by
11References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 21, 2021
Grant dateApr 2, 2024
Priority date
Expiry dateNov 20, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D3/38
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

This disclosure relates to a dielectric film-forming composition that includes at least one cyclized polydiene resin, and one or both of at least one reactive functional compound and at least one catalyst.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.