Analyzing in-plane distortion
US11948846B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2023 |
| Grant date | Apr 2, 2024 |
| Priority date | — |
| Expiry date | Apr 4, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods and systems are described for generating assessment maps. A method includes receiving a first vector map comprising a first set of vectors each indicating a distortion of a particular location on a substrate and generating a second vector map indicating a change in direction of a magnitude of the distortion of the particular location on the substrate. The method further includes generating a third vector map comprising vectors reflecting reduced noise in distortions across the plurality of locations on the substrate and generating a fourth vector map projecting a direction component of each vector component in the third set of vectors to a radial direction. The method further includes generating a fifth vector map by grouping the vectors of the fourth set of vectors and determining a magnitude associated with each group of vectors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.