Automatic adjustment method and automatic adjustment device of beam of semiconductor apparatus, and training method of parameter adjustment model
US11955309B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2021 |
| Grant date | Apr 9, 2024 |
| Priority date | — |
| Expiry date | Sep 19, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.