Substrate processing systems including gas delivery system with reduced dead legs

US11959172B2 · kind B2 · utility

Assignee

• Lam Research Corporation · US

Inventors

• Ramesh Chandrasekharan · Portland, US
• Antonio Xavier · Mulino, US
• Frank L. Pasquale · Beaverton, US
• Ryan Blaquiere · Portland, US
• Jennifer Leigh Petraglia · Portland, US
• Meenakshi Mamunuru · Tigard, US

Key dates

• Filing date: May 12, 2023
• Grant date: Apr 16, 2024
• Expiry date: May 12, 2043

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67017
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A gas delivery system includes a 2-port valve including a first valve located between a first port and a second port. A 4-port valve includes a first node connected to a first port and a second port. A bypass path is located between the third port and the fourth port. A second node is located along the bypass path. A second valve is located between the first node and the second node. A manifold block defines gas flow channels configured to connect the first port of the 4-port valve to a first inlet, configured to connect the second port of the 4-port valve to the first port of the 2-port valve, the third port of the 4-port valve to a second inlet, the second port of the 2-port valve to a first outlet, and the fourth port of the 4-port valve to a second outlet.