EUV mask defect tool apparatus
US11960202B1 · kind B1 · utility
1Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2021 |
| Grant date | Apr 16, 2024 |
| Priority date | — |
| Expiry date | Oct 21, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/068
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An EUV microscope device utilizing a source of a beam of EUV light. The light is sent to a collector which produces a first focused EUV beam. A monochromator receives the first focused EUV beam and produces a second EUV beam that is passed to an illumination module. The output of the illumination module is passed to a mask. The reflected beam from the mask is sent to a zone plate and a detector to produce an image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.