Substrate holding apparatus and substrate processing apparatus
US11961757B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 1, 2018 |
| Grant date | Apr 16, 2024 |
| Priority date | — |
| Expiry date | Aug 1, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate holding apparatus is used for a substrate processing apparatus for supplying the processing liquid to a substrate. The substrate holding apparatus includes a holding member, a ring member, and a rotation mechanism. The holding member holds the substrate in a horizontal attitude. The ring member is in a shape of a ring surrounding a peripheral edge of the substrate held by the holding member, and has an upper surface level with or positioned below a front surface of the substrate. The rotation mechanism rotates the holding member and the ring member about a rotation axis at rotation speeds different from each other and/or in rotational directions different from each other, the rotation axis being a vertical axis passing through the substrate held by the holding member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.