Selective deposition of metal oxides on metal surfaces
US11965238B2 · kind B2 · utility
1Cited by
101References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2020 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Mar 31, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45525
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods for selective deposition of metal oxide films on metal or metallic surfaces relative to oxide surfaces are provided. An oxide surface of a substrate may be selectively passivated relative to the metal or metallic surface, such as by exposing the substrate to a silylating agent. A metal oxide is selectively deposited from vapor phase reactants on the metal or metallic surface relative to the passivated oxide surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.