Systems and methods for reducing resist model prediction errors
US11966167B2 · kind B2 · utility
0Cited by
7References
20Claims
0Family size
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Key dates
| Filing date | Dec 20, 2018 |
| Grant date | Apr 23, 2024 |
| Priority date | — |
| Expiry date | Jan 20, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706839
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for calibrating a resist model. The method includes: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting one or more of the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.