Patent · US Active

Method of operating a deposition or cleaning apparatus

US11970774B2 · kind B2 · utility

0Cited by

0References

8Claims

0Family size

Assignee

Picosun Oy · FI

Inventor

Timo Malinen · Espoo, FI

Key dates

Filing date	Feb 2, 2023
Grant date	Apr 30, 2024
Priority date	—
Expiry date	Feb 2, 2043

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/68792
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A deposition or cleaning apparatus comprising an outer vacuum chamber and a reaction chamber inside the outer chamber forming a double chamber structure. The reaction chamber is configured to move between a processing position and a lowered position inside the outer vacuum chamber, the lowered position being for loading one or more substrates into the reaction chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.