Enforcing mask synthesis consistency across random areas of integrated circuit chips
US11977327B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 2022 |
| Grant date | May 7, 2024 |
| Priority date | — |
| Expiry date | May 20, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system generates a mask for a circuit design while enforcing symmetry and consistency across random areas of the mask. The system builds a mask solutions database mapping circuit patterns to mask patterns. The system uses the mask solutions database to replace circuit patterns of the circuit design with mask patterns. The system identifies properties in circuit patterns of the circuit design and enforces the same property in the corresponding mask patterns. Examples of properties enforced include symmetry within circuit patterns and similarity across circuit patterns. The system combines mask patterns in different regions of the circuit and resolves conflicts that occur when there are multiple masks within a region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.